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Application of molecular pump group in vacuum tube furnace
Application of molecular pump group in vacuum tube furnace
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Application of molecular pump group in vacuum tube furnace
Research institutions generally use vacuum tube furnaces for element analysis and heating of new materials such as quenching, annealing, tempering, and electronic ceramics for small steel parts The vacuum tube furnace uses resistance wires as heating elements and adopts a single-layer, double-layer or multi-layer shell structure, which is particularly suitable for annealing and sintering samples in an atmosphere protected or vacuum environment

Vacuum tube furnace is used in universities, research institutes, and industrial and mining enterprises for high-temperature atmosphere sintering and atmosphere reduction, The ideal product for CVD experiments and vacuum annealing applications The vacuum degree is generally between 10-2 Torr, which can be satisfied by using a mechanical pump However, some applications require high vacuum environments with a vacuum requirement of 10-5 Torr, and it is recommended to use the German Pfeiffer molecular pump group
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GermanyPfeifferMolecular pump groupHicube 80 EcoyesPerfect configuration of tube furnace vacuum system

分子泵组

The overall modular design of the molecular pump group integrates diaphragm pumps and molecular pumps internally, making it "plug and play",
Pre stage pump (dry vacuum pump): MVP 015
Molecular pump: HiPace 80
Pre stage pump pumping speed (50 Hz): 0.50 m3/h
Extraction speed (N2): 67 l/s
Ultimate vacuum degree:< 1x10-7 hPa
Compact design, air-cooled, easy to maintain

Considering the confidentiality of customer information, if you need further understanding of the application of molecular pump units in vacuum tube furnaces, please refer to the following contact information
Shanghai Bodong: Miss Ye Taiwan Bodong: Miss Wang
T: +86-21-5046-3511 ext 109 T: +886-3-567-9508 ext 161
F: +86-21-5046-1490 F: +886-3-567-0049
M: +86 1391-883-7267 M: +886-939-653-958
ec@hakuto-vacuum.cn ec@hakuto.com.tw
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